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2001年版Mask Makers Data Bookには次のマスクショップの設備・サービス内容が掲載されています。
■USA
- Adtec Photomask
- Advance Reproductions
- Agilent Technologies
- Allegro Microsystems
- Applied Image Group/Image
- Arizona State University
- Compugraphics USA
- Conexant Systems
- Cornell University
- Du Pont Photomasks
- Kokomo, Indiana
- Round Rock, Texas
- Santa Clara, California
- Etec/Applied Materials
- Hayward, California
- Hillsboro, Oregon
- Gennum
- HTA Photomask
- IBM
- Endicott, New York
- Essex Junction, Vermont
- San Jose, California
- Yorktown Heights, New York
- Image Technology
- Infinite Graphics
- Colorado Springs, Colorado
- Minneapolis, Minnesota
- Intel
- LSI Photomasks
- Microchip Technology
- Microtronics
- Minnesota State University
- Nortel Networks
- Northrop-Grumman
- Photo Sciences
- Photoronics
- Allen, Texas
- Austin, Texas
- Brookfield, Connecticut
- Burbank, California
- Milpitas, California
- Palm Bay, Florida
- Phoenix, Arizona
- Photoronics/IBM Mask Center of Competency
- Process Technologies
- Rochester Institute of Technology
- Sawtek
- Semiconix
- Stanford University
- Union Semiconductor Technology
- University of California, Berkeley
- University of Illinois
- Chicago, Illinois
- Urbana, Illinois
- University of Notre Dame
- U.S. Department of Defense
- Fort Meade, Maryland
- McClellan AFB, California
- U.S. Navy
- Vishay-Siliconix
■EUROPE
- All Russian Electrotechnical Institute
- Angstrem Institute of Fine Technology
- Austria Micro System
- Belgravur, V. Mulch
- Central Microstructure Facility
- Compugraphics International
- Corning Research Center
- Du Pont Photomask
- Corbeil, France
- Hamburg, Germany
- High Blantyre, Scotland, United Kingdom
- Rousset, France
- Ferdinand Braun Institute
- Friedrich Schiller Universitat
- IMT Masken und Teilung
- Infinion Technologies
- Institut fur Mikroelektronik
- Institute of Electronic Materials Technology
- Micronas
- ML&C
- Mascow State Institute of Electrical Engineering
- Photoronics
- Dresden, Germany
- Heilbronn, Germany
- Manchester, England, United Kingdom
- Mid-Glamorgan, Wales, United Kingdom
- POG Praezisionsoptik
- Robert Bosch
- Slovak Academy of Sciences
- STEAG microParts
- ST Microelectronics
■JAPAN
- Dai Nippon Printing
- D.T. Fine Electronics
- Fujitsu
- Hoya
- Matsushita Electronics
- Kyoto
- Nagaokakyo
- NEC
- Nippon Filcon
- Sanyo Electric
- Shashin Kagaku
- Sony (Toppan Atsugi Line)
- Toppan Printing
- Yamaha
■ASIA PACIFIC and ROW
- Beijin Dong Gudng, China
- Bharat Electronics, India
- China Huajing Electronics Group, Chine
- Chinese Academy of Sciences, China
- Institute of Semiconductors
- Microelectronics R&D Center
- Microfabrication Laboratory
- Stae Key Laboratory for Microfabrication
- Du Pont Photomasks
- Shanghai, China
- Ichon, Korea
- Hsinchuu, Taiwan
- Singapore, Singapore
- Hebei Semiconductor Research Institute, China
- Hua Yue Microelectronics, China
- Hyundai Electronics, Korea
- IC Machinery Industry Design and Mask Making Center, China
- Instituto Nacional de Technologia Informacao, Brazil
- ITI Ltd., India
- Lishan Microelectronics, China
- Najing Electronic Device Institute, China
- National Nano Device Laboratory, Taiwan
- Norinco(G) no. 214 Research Institute, China
- Northeast Microelectronics Institute, China
- Pacific Microelectronics, Hong Kong, China
- Photoronics
- Singapore, Singapore
- Hsinchu, Taiwan
- PKL, Korea
- Samsung Electronics, Korea
- Shanghai Miker Electronics, China
- Shaoguang Microelectronics Corp., China
- Shenzhen Qingyprecision Mask Making, China
- Sichuan Institute of Piezoelectronic & Acousto-Optic, China
- Sichuan Solid State Cirsuits Research Institute, China
- Taiwan Mask Corporation, Taiwan
- Taiwan Semiconductor Manufacturing, Taiwan
- HSIP Mask Dept. 1, Fab 3, Hsinchu
- HSIP Mask Dept. 2, Fab 8, Hsinchu
- TSIP Mask Dept. 1, Fab 6, Hsinchu
- Toppan Chunghwa Electronics, Taiwan
- Universidade Estadual de Campinas, Brazil
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